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气熔透明 1 材料简介 测试测试2

材料简介

Introduction

气熔 首图 拷贝.jpg

气熔开云网页版材料


气泡少,具有良好的透明度和几何尺寸。广泛应用于半导体、光纤、太阳能光伏、光学镀膜等领域。


The material has few bubble in it with excellent transparency and geometric dimension .They are widely used for semiconductor,Optical Fiber, Solar Energy Photovoltaics, Optical Coating/Filming.

气熔开云网页版材料.jpg

气熔高纯少气泡开云网页版材料


气熔高纯少气泡开云网页版材料,具有气泡少、纯度高,几乎无包裹物、耐高温性能等特性,广泛的应用于半导体先进制程、光学、化学加工、紫外线和高温窗口等。


Thanks to the few bubbles, high purity, almost no inclusion, high temperature resistant performance and other characteristics,FLH321HS has been widely used in semiconductor advanced manufacturing, optical, chemical processing, UV and high temperature window.

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